A Method for Beating the Diffraction Limit in Photolithography
- Etec Systems, Inc., An Applied Materials Company
- 2001 – 2002
- Peter N Saeta
Etec Systems, Inc. is a worldwide leader in the designing, manufacturing, and marketing of mask-making solutions for the semiconductor industry. Our Clinic team is providing Etec with a feasibility study on a potential technology for tightening the focus point of a laser on the photoresist layer of a mask beyond the normal diffraction limit, enabling the writing of smaller mask features. We report both analytical and experimental results.