A Method for Beating the Diffraction Limit in Photolithography

Sponsor
Etec Systems, Inc., An Applied Materials Company
Year
2001 – 2002
Advisor
  • Peter N Saeta

Etec Systems, Inc. is a worldwide leader in the designing, manufacturing, and marketing of mask-making solutions for the semiconductor industry.  Our Clinic team is providing Etec with a feasibility study on a potential technology for tightening the focus point of a laser on the photoresist layer of a mask beyond the normal diffraction limit, enabling the writing of smaller mask features.  We report both analytical and experimental results.

The Physics Clinic presents opportunities for students to work on practical projects relevant to industrial work. Students work on teams of 3–5 on a sponsored research or development project.